Electrodeposited Co-Cu/Cu multilayered microposts
Document Type
Article
Publication Date
12-1-2008
Abstract
X-ray lithography and electrodeposition were combined to deposit an array of Co-Cu/Cu multilayer microposts of 500 μm tall into deep recesses for novel giant magnetoresistance (GMR) architectures. A citrate-boric acid electrolyte was used with pulsed potential. The applied potential was determined through inspection of the polarization curve from linear sweep voltammetry, and scanning electron microscopy (SEM)/transmission electron microscope (TEM) confirmed the micropost layered structure. Room temperature magnetoresistance was reported for different bilayer sizes of the micropost, and up to 4% current perpendicular-to-plane giant magnetoresistance (CPP-GMR) with saturation values less than 1 T was observed. © 2008 Elsevier B.V. All rights reserved.
Publication Source (Journal or Book title)
Journal of Magnetism and Magnetic Materials
First Page
3282
Last Page
3287
Recommended Citation
Li, Y., Moldovan, M., Young, D., & Podlaha, E. (2008). Electrodeposited Co-Cu/Cu multilayered microposts. Journal of Magnetism and Magnetic Materials, 320 (23), 3282-3287. https://doi.org/10.1016/j.jmmm.2008.06.034