Title

Electrodeposited Co-Cu/Cu multilayered microposts

Document Type

Article

Publication Date

12-1-2008

Abstract

X-ray lithography and electrodeposition were combined to deposit an array of Co-Cu/Cu multilayer microposts of 500 μm tall into deep recesses for novel giant magnetoresistance (GMR) architectures. A citrate-boric acid electrolyte was used with pulsed potential. The applied potential was determined through inspection of the polarization curve from linear sweep voltammetry, and scanning electron microscopy (SEM)/transmission electron microscope (TEM) confirmed the micropost layered structure. Room temperature magnetoresistance was reported for different bilayer sizes of the micropost, and up to 4% current perpendicular-to-plane giant magnetoresistance (CPP-GMR) with saturation values less than 1 T was observed. © 2008 Elsevier B.V. All rights reserved.

Publication Source (Journal or Book title)

Journal of Magnetism and Magnetic Materials

First Page

3282

Last Page

3287

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