Orientation studies of Si-phthalocyanine sulfonic acids cast on SiOx substrates
Document Type
Article
Publication Date
2-1-2003
Abstract
Layers of dihydroxy silicon phthalocyanine tetrasulfonic acid and oligo-μ-oxo silicon phthalocyanine tetrasulfonic acid were prepared by solution-casting methods. The purity of the material was checked by X-ray photoemission spectroscopy. The orientation of the molecules in respect to the substrate plane was investigated by angle-dependent near-edge X-ray absorption fine-structure spectroscopy. The morphology was characterized by atomic force microscopy. Most samples exhibited a significant orientation that was accompanied by crystalline structures; others had no orientation at all with a dominant amorphous morphology. This behavior indicates that several preparation parameters affect the crystallinity and the orientation of the phthalocyanines.
Publication Source (Journal or Book title)
Applied Physics A: Materials Science and Processing
First Page
177
Last Page
182
Recommended Citation
Appel, G., Ade, H., Guerek, A., Stadler, S., Mikalo, R., & Schmeißer, D. (2003). Orientation studies of Si-phthalocyanine sulfonic acids cast on SiOx substrates. Applied Physics A: Materials Science and Processing, 76 (2), 177-182. https://doi.org/10.1007/s003390201320