Document Type
Article
Publication Date
1-17-2000
Abstract
The photodegradation mechanism due to synchrotron radiation exposure of crystalline poly[vinylidene fluoride-trifluoroetylene, P(VDF-TrFE)] copolymer thin films has been studied with ultraviolet photoemission spectroscopy (UPS) and mass spectroscopy. Upon increasing exposure to x-ray white light (hv≤ 1000eV), UPS measurements reveal that substantial chemical modifications occur in P(VDF-TrFE) 5 monolayer films, including the emergence of new valence band features near the Fermi level, indicating a semimetallic photodegradeted product. The photodetached fragments of the copolymer consist mainly of H2, HF, CHF, CH2. This x-ray exposure study demonstrates that P(VDF-TrFE) films, possessing unique technologically important properties, can be directly patterned by x-ray lithographic processes. © 2000 American Institute of Physics.
Publication Source (Journal or Book title)
Applied Physics Letters
First Page
381
Last Page
383
Recommended Citation
Choi, J., Manohara, H., Morikawa, E., Sprunger, P., Dowben, P., & Palto, S. (2000). Thin crystalline functional group copolymer poly(vinylidene fluoride-trifluoroethylene) film patterning using synchrotron radiation. Applied Physics Letters, 76 (3), 381-383. https://doi.org/10.1063/1.125760