Characterization of Fe1-xCoxSi thin films deposited via pulsed laser deposition
We report on the structural and morphological characterization of B20 cubic structure Fe1-xCoxSi thin films grown by pulsed laser deposition for the concentration range 0 ≤ × ≤ 0.3 deposited on Si (111) substrate. The x-ray diffraction, Rutherford back scattering (RBS), Scanning Electron microscopy (SEM) and Atomic force microscopy (AFM) of the films show that all the films are single phase B20 cubic structure with concentrations close to expected values, very smooth and dense with surface roughness less than 0.8 nm. © 2008 American Institute of Physics.
Publication Source (Journal or Book title)
AIP Conference Proceedings
Manyala, N., Ngom, B., Kana-Kana, J., Bucher, R., Maaza, M., & DiTusa, J. (2008). Characterization of Fe1-xCoxSi thin films deposited via pulsed laser deposition. AIP Conference Proceedings, 1047, 127-129. https://doi.org/10.1063/1.2999915