Title
Resist-free patterning of surface architectures in polymer-based microanalytical devices
Document Type
Article
Publication Date
1-26-2005
Abstract
The ability to form patterns of chemically reactive surface functionalities in microanalytical devices using a simple photopatterning approach without the need for photoresist-based methods is described. Direct UV exposure of the surfaces of poly(methyl methacrylate), PMMA, and poly(carbonate), PC, microfluidic devices through optical masks leads to the production of patterns of near monolayer quantities of surface carboxylic acid groups as determined by surface coverage, X-ray photoelectron spectroscopy, and fluorescence microscopy experiments. Formation of the reactive carboxylic acid groups without significant physical (topographical) damage to the polymer device substrates is achieved by use of low UV fluence and exposure times. Modification of the patterned, surface carboxylic acid groups with metals, thermally responsive polymers, and antibodies results in microfluidic devices possessing metallic interconnects and detection electrodes and the ability to capture intact biological cells and proteins from solution. Copyright © 2005 American Chemical Society.
Publication Source (Journal or Book title)
Journal of the American Chemical Society
First Page
842
Last Page
843
Recommended Citation
McCarley, R., Vaidya, B., Wei, S., Smith, A., Patel, A., Feng, J., Murphy, M., & Soper, S. (2005). Resist-free patterning of surface architectures in polymer-based microanalytical devices. Journal of the American Chemical Society, 127 (3), 842-843. https://doi.org/10.1021/ja0454135