CVD of Copper from Cu(II) Precursors
© VCH Verlagsgesellschaft mbH, D-6945 1 Weinheim (Federal Republic of Germany), 1994. All rights reserved. We review the current status of Cu CVD processes based on Cu(II) precursor compounds. Topics include: A chronological review of the field, the synthesis and properties of volatile Cu(II) compounds, adsorption studies of these and related compounds, mechanistic considerations, growth rates and reaction conditions, film properties, CVD reactor design considerations, plasma-assisted CVD, and photo-assisted CVD.
Publication Source (Journal or Book title)
The Chemistry of Metal CVD
Griffin, G., & Maverick, A. (2007). CVD of Copper from Cu(II) Precursors. The Chemistry of Metal CVD, 175-238. https://doi.org/10.1002/9783527615858.ch4