Three-Dimensional Nanostructure Construction via Nanografting: Positive and Negative Pattern Transfer
Three-dimensional nanostructures can be constructed using scanning probe lithography in combination with selective surface reactions. This letter introduces a successful approach using AFM-based nanografting to produce two-dimensional nanopatterns within self-assembled monolayer resists. These nanopatterns serve as an anchor to construct nanostructures in the third dimension via surface reactions. In this way, the nanometer-scale 20 pattern is transferred to chemically distinct 3D nanostructures. This approach offers the advantages of high spatial precision and selectivity in pattern transfer.
Publication Source (Journal or Book title)
Liu, J., Cruchon-Dupeyrat, S., Garno, J., Frommer, J., & Liu, G. (2002). Three-Dimensional Nanostructure Construction via Nanografting: Positive and Negative Pattern Transfer. Nano Letters, 2 (9), 937-940. https://doi.org/10.1021/nl025670c